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Year : 2017  |  Volume : 9  |  Issue : 3  |  Page : 189-193

Comparative evaluation of shear bond strength of two adhesive systems before and after contamination with oral fluids: An In vitro study

Department of Pedodontics, Himachal Institute of Dental Sciences, Paonta Sahib, Himachal Pradesh, India

Correspondence Address:
Nupur Kesar
Department of Pedodontics, Himachal Institute of Dental Sciences, Poanta Sahib-173025, Himachal Pradesh
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Source of Support: None, Conflict of Interest: None

DOI: 10.4103/IJDS.IJDS_29_17

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Aim: This study aims to evaluate the effect of saliva and blood contamination on the shear bond strength (SBS) of self- and total-etch adhesive systems on enamel and dentin. Materials and Methods: Sample of 100 extracted noncarious primary molars were taken as experimental groups, which were divided into two groups: self-etch group and total-etch group containing fifty teeth each. These groups were further divided into five subgroups - 10 teeth each. The specimens were then subjected to contamination with saliva or blood; before and after application of adhesive agent, whereas, in control group, there was no contamination done before and after adhesive application. Fresh saliva and blood were used. After the bonding procedure, resin composite was built up with diameter and height of 3 mm. After that, the specimens were tested for SBS in universal testing machine at a crosshead speed of 1 cm/min. The results were then statistically analyzed using one-way ANOVA. Results: The results of the study revealed that the SBS of self-etch adhesive system was better than the total-etch adhesive system and there was significant difference found among various subgroups of total-etch group, i.e., when adhesive application was done before, after and without saliva or blood contamination. There was no significant difference found within the subgroups of self-etch group when adhesive application was done before, after, and without saliva contamination. In case of blood contamination, significant difference was found in SBS in both self- and total-etch groups.

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